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Installation vacuum VTT PLASMA M3 IS1 for drawing thin-film coverings of Al on substrates from Si buy in Smorgon
ALL.BIZ Belarus Belarus products Industrial equipment Industrial thermal equipment Drying equipment Vacuum installations Installation vacuum VTT PLASMA M3 IS1 for drawing thin-film coverings of Al on substrates from Si
Installation vacuum VTT PLASMA M3 IS1 for drawing thin-film coverings of Al on substrates from Si
Installation vacuum VTT PLASMA M3 IS1 for drawing thin-film coverings of Al on substrates from Si
ustanovka_vakuumnaya_vtt_plasma_m3_is1

Installation vacuum VTT PLASMA M3 IS1 for drawing thin-film coverings of Al on substrates from Si

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Technical characteristics
  • BrandVTT
  • Country of manufactureBelarus
Description

The vacuum VTT PLASMA M3 IS1 installation for drawing in vacuum of thin-film coverings of Al on substrates from Si in the magnetron way with preliminary cleaning with an ionic source.

Installation provides uniform drawing coverings on one lateral surface of a plate, 125 mm by 125 mm in size, plate thickness 220±20µm, at simultaneous loading of 300 products.

Vacuum installation has to be operated on production sites and in laboratories at a temperature of air from 17 to 25ºС, relative humidity of air from 40 to 75% and atmospheric pressure 84,0*10 ³ - 106,0*10³pa.

Use of installation for drawing decorative coverings on products from various materials is possible.

Yours faithfully, director of the enterprise

Vasily Semenovich

ph. mob: 375 (29) 6154641

skype: vvs_12

e-mail: vactt@mail.ru

TECHNICAL CHARACTERISTICS.

1. Internal size of a chamber: D=1060 mm, H=2370.

2. Limit residual vacuum of 9х10-4 Pas in a chamber.

3. The power consumed by installation:

- in the pumping mode - 12 kW;

- in the mode of cleaning and drawing a covering - to 60 kW. (depending on quantity of at the same time used sources)

STRUCTURE OF INSTALLATION.

No. of a payment order Name Quantity.
1. Magnetron source with the power supply unit.

Size of a target, mm

Power supply unit

- category current, move, And

3 pieces.

2230*100*10.

3 pieces.

40

2. Ionic source

- working zone, mm

- category current, And

- working tension, In

1

2100*70

0.7
3000

3. Industrial equipment of drum type.

Quantity of at the same time loaded products of 125*125 mm in size (the option of industrial equipment directly under the customer's products is possible)

2 sets.

300 pieces.

4. Forvacuum Okta 500 / HENA 300 (PFEIFFER) unit 1
5. High-vacuum otkachny the module on the basis of the diffusive pump NVDM-400 1
6. Lock high-vacuum Du 400 air-controlled and possibility of a drosselirovaniye of pumping 1
7. Heaters managements with the temperature of substrate, intra chamber with an opportunity, up to 400 ˚ Page. 4
8. Vacuum sensors:

- PFEIFFER IKR 251

- PFEIFFER PKR 251

- PFEIFFER TPR 280

1

1

2

8. Control of thickness of coverings:

- Quartz controller of thickness.

- Control of resistance on a sample.

1

1

8 System pneumatic on the basis of the SMC elements 1
9 System hydraulic on the basis of the SMC elements 1
10 System automatic supply of technological gases with a possibility of work along with 4-8 gases 1
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Installation vacuum VTT PLASMA M3 IS1 for drawing thin-film coverings of Al on substrates from Si
Installation vacuum VTT PLASMA M3 IS1 for drawing thin-film coverings of Al on substrates from Si
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